Title:
IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2023035604
Kind Code:
A
Abstract:
To provide an imprint device which can reduce chipping of a pattern and damage of a mold by removing a foreign matter in a piping system of the imprint device.SOLUTION: An imprint device includes: a chuck which has a plurality of sections formed by a partition wall and holds a substrate; a first flow channel which is in fluid communication with at least one section among a plurality of sections; a gas supply part which is in fluid communication with one section through a second flow channel connected to the first flow channel, and supplies gas to the one section; a negative pressure supply part which is in fluid communication with one section through a third flow channel connected to the first flow channel, and supplies a negative pressure to the one section; a control part for controlling time or an amount of gas to be supplied so as to discharge a foreign matter insides the first to third flow channels, a first valve for opening/closing the second flow channel and a second valve for opening/closing the third flow channel to the outside of the chuck from the downstream side of the first flow channel; and a cleaning part collecting the foreign matter discharged to the outside of the chuck.SELECTED DRAWING: Figure 8
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Inventors:
KIMURA KEISUKE
Application Number:
JP2021142597A
Publication Date:
March 13, 2023
Filing Date:
September 01, 2021
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027
Attorney, Agent or Firm:
Ryoichi Takaoka
Nao Oda
Rena Miyoshi
Nao Oda
Rena Miyoshi