Title:
プレ注入フィルタを有する注入シード方式F2レーザ
Document Type and Number:
Japanese Patent JP2004524706
Kind Code:
A
Abstract:
A narrow band F2 laser system useful for integrated circuit lithography. An output beam from a first F2 laser gain medium is filtered with a pre-gain filter to produce a seed beam having a bandwidth of about 0.1 pm or less. The seed beam is amplified in a power gain stage which includes a second F2 laser gain medium. The output beam of the system is a pulsed laser beam with a full width half maximum band width of about 0.1 pm or less with pulse energy in excess of about 5 mJ. In a preferred embodiment the pre-gain filter includes a wavelength monitor which permits feedback control over the centerline wavelength so that the pre-gain filter optics can be adjusted to ensure that the desired bandwidth range is injected into the power gain stage.
Inventors:
Sandstrom Richard El
Partro William N
Onkels Ekharddi
Partro William N
Onkels Ekharddi
Application Number:
JP2002580448A
Publication Date:
August 12, 2004
Filing Date:
April 04, 2002
Export Citation:
Assignee:
Cymer, Inc.
International Classes:
G03F7/20; H01S3/03; H01L21/027; H01S3/08; H01S3/0943; H01S3/097; H01S3/0971; H01S3/139; H01S3/223; H01S3/23; H01S3/036; H01S3/038; H01S3/041; H01S3/102; H01S3/22; H01S3/225; (IPC1-7): H01S3/23; H01L21/027; H01S3/0943; H01S3/139
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Toshio Imajo
Takaki Nishijima
Fumiaki Otsuka
Toshio Imajo
Takaki Nishijima