Title:
検査方法
Document Type and Number:
Japanese Patent JP6513951
Kind Code:
B2
Abstract:
An inspection apparatus includes a lighting unit, an imaging unit, an optical image comparison unit, a map creation unit, a map storage unit, a first storage unit, a map comparison unit, and a first determination unit. The lighting unit irradiates a sample including a defect to be inspected with a lighting light. The imaging unit obtains either or both of a first optical image formed by the lighting light transmitted through the sample to be inspected and a second optical image formed by the lighting light reflected by the sample to be inspected and obtains either or both of a third optical image formed by the lighting light transmitted through the sample to be inspected and having a corrected defect and a fourth optical image formed by the lighting light reflected by the sample to be inspected and having a corrected defect. The optical image comparison unit performs either or both of a first comparison between a first reference image referenced from an optical image formed by the lighting light transmitted through the sample to be inspected and the first optical image and a second comparison between a second reference image referenced from an optical image formed by the lighting light reflected by the sample to be inspected and the second optical image and performs either or both of a third comparison between the first reference image and the third optical image and a fourth comparison between the second reference image and the fourth optical image. The map creation unit creates either or both of a first map of the sample to be inspected based on the first comparison and a second map of the sample to be inspected based on the second comparison and creates either or both of a third map of the sample to be inspected based on the third comparison and a fourth map of the sample to be inspected based on the fourth comparison. The map storage unit stores either or both of the first map and the second map. The first storage unit stores defect correction method information on the defect. The map comparison unit performs either or both of a fifth comparison between the first map and the third map based on the defect correction method information and a sixth comparison between the second map and the fourth map based on the defect correction method information. The first determination unit determines, based on the defect correction method information and either or both of the fifth comparison and the sixth comparison, whether the correction is appropriate.
Inventors:
Hideo Tsuchiya
Nobutaka Kikuiri
Nobutaka Kikuiri
Application Number:
JP2015002623A
Publication Date:
May 15, 2019
Filing Date:
January 08, 2015
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
G03F1/84; G01N21/956
Domestic Patent References:
| JP2012021959A | ||||
| JP2004356330A | ||||
| JP63122218A | ||||
| JP2014182064A | ||||
| JP2008026822A | ||||
| JP2004354088A | ||||
| JP2008268424A | ||||
| JP2011048393A |
Foreign References:
| US20060051681 |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama
Akira Sudo
Mitsuyuki Matsuyama