LARGE AREA EXPOSURE APPARATUS

Japanese Patent JPS59200419

A

PURPOSE:To obtain an apparatus by which a large area substrate can be exposed without unevenness by a method wherein a light source and a photomask are made solid with a cylindrical drum and rotate and advance together to expose the surface of a resist. CONSTITUTION:A light source 4 and a photomask 3 are made solid with a transparent cylindrical drum 6 at its inside and outside respectively and rotate and advance together to perform exposure. For instance, the inside of a transparent cylindrical quartz drum 6 is coated with a heat reflective film (In2O3, SnO2) 8 and rotation supporting guides 13 are provided to both ends of the drum and a film mask 3 is wound around the outside of the drum adhering tightly and both ends of the mask are fixed and a high voltage mercury lamp source 4 is set in the drum. Al 5 is evaporated on a glass substrate 1 and coated with negative resist 2. The drum 6 is set on the coated glass substrate and the exposure is performed by scanning by a rotary motor 14.

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AOKI TOSHIO
IKEDA MITSUSHI
SUZUKI KOUJI

JP7381783A

November 13, 1984

April 28, 1983

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TOSHIBA KK

G03F7/20; H01L21/027; H01L21/30; (IPC1-7): G03F7/20

Noriyuki Noriyuki

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