Title:
LASER PROJECTION SYSTEM AND METHOD FOR RESTORATION OF PHOTOLITHOGRAPHIC MASK
Document Type and Number:
Japanese Patent JP3694828
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a system and method for restoration of a photolithographic mask.
SOLUTION: The system has a structure for supporting the mask to be processed, a laser radiation device for executing mask restoration, a light source for selective irradiation of the mask adjacent to the supporting structure, a laser processor for executing the continuous angular operation of the laser beam emitted from the laser radiation device, a computer device for controlling the continuous angular operation in such a manner that nearly the perfect wavelength of the beam may be acquired and a microscope for multivisual point observation of the mask during the guidance of the beam to the mask. The computer device executes the exact movement control of the beam, the controlled movement of a motor driven aperture for executing the continuous angular operation, the movement of the controlled supporting structure and image data processing.
Inventors:
Jianghu
John O'Connor
John O'Connor
Application Number:
JP2001050391A
Publication Date:
September 14, 2005
Filing Date:
February 26, 2001
Export Citation:
Assignee:
Quantronics Corporation
International Classes:
G01N21/956; B23K26/03; B23K26/06; G03F1/72; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP3255444A |
Attorney, Agent or Firm:
Kenho Ikeda