MALEIMIDE COPOLYMER AND COMPOSITION FOR REGIST

Title:

MALEIMIDE COPOLYMER AND COMPOSITION FOR REGIST

Document Type and Number:

Japanese Patent JP2002220424

Kind Code:

A

Abstract:

To provide a useful maleimide copolymer as a resist resin excellent in the drying etching resistance.

The copolymer contains the units represented by the formulas (1) and (2) [R is an alkyl group which may have a substituted group; Z ring is a lactone ring; x is an integer of 0-3]. Further, it may contain at least one unit selected from (meth)acrylic acid or its ester and, maleic anhydride or its ester. The copolymer is useful as a resist composition combined with an optical acid generating agent.

More Like This:

JP2013144652	ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR MANUFACTURING THE SAME
JPH11352693	RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
WO/2004/074937	IMMERSION EXPOSURE PROCESS-USE RESIST PROTECTION FILM FORMING MATERIAL, COMPOSITE FILM, AND RESIST PATTERN FORMING METHOD

Inventors:

HORAI AKIRA
FUNAKI KATSUNORI

Application Number:

JP2001015891A

Publication Date:

August 09, 2002

Filing Date:

January 24, 2001

Export Citation:

Click for automatic bibliography generation Help

Assignee:

DAICEL CHEM

International Classes:

G03F7/039; C08F220/06; C08F220/18; C08F220/28; C08F222/06; C08F222/10; C08F222/40; C08F232/08; C08K5/00; C08L33/02; C08L33/04; C08L35/00; C08L45/00; (IPC1-7): C08F222/40; C08F220/06; C08F220/18; C08F220/28; C08F222/06; C08F222/10; C08F232/08; C08K5/00; C08L33/02; C08L33/04; C08L35/00; C08L45/00; G03F7/039

Attorney, Agent or Firm:

Mitsuo Hokita

Previous Patent: CROSSLINKED LOW-RATIO DIELECTRIC HIGH-MOLECULAR MATERIAL, FILM, SUBSTRATE AND ELECTRONIC COMPONENT U...

Next Patent: METHOD FOR PRODUCING BLOCK COPOLYMER