PURPOSE: To manufacture property and advantageously fine isometric silicon nitride powder of high purity by grinding a substance contg. Si.N obtd. in a synthesizing stage with a grinding mechanism whose principal constituent component is a molded silicon nitride body, and treating the resulting powder under specified conditions.
CONSTITUTION: Silicon halide or silane represented by a formula SiHnX4-n (where X is F, Cl, Br or I, and (n) is an integer of 0W4) is reacted with a gaseous mixture of ammonia and/or nitrogen with hydrogen to obtain a mainly amorphous substance contg. Si.N. This substance is ground or crushed with a mechanical grinder having a grinding mechanism whose principal constituent component is a molded silicon nitride body. The resulting powder is heated at 1,000W1,700°C in an atmosphere contg. nitrogen, hydrogen, ammonia or a mixture thereof to manufacture fine isometric silicon nitride powder of high purity with superior characteristics at high temp.
HASEGAWA MASASHI
TANJI HIROAKI
HIYAMA SHIGEO
| JPS5921506A | 1984-02-03 |