MANUFACTURE OF MICROSTRUCTURE BY ANISOTROPIC ETCHING AND SUBSTRATE JOINTING

Japanese Patent JP2580497

B2

PURPOSE: To manufacture a structure which has a mechanical function into various constitution by combining together identical substrate or different kind substrate jointing technology and selective anisotropic etching technology and decreasing photographic transfer processes.
CONSTITUTION: After a [110] substrate 110 and a [100] substrate 1102 are jointed together, the 100 substrate 1102 is formed into a thin film. On one surface of a substrate 1101, an etching protection mask 1103 is formed to form an etching window 1104. This is etched anisotropically in a KOH and EDP solution, and the etching is advanced while a [111] surface 1105 is exposed at right angles to the substrate surface. After the substrate 1101 is etched into a quadrilateral prism, the etching is continued on, while the bottom surface 1107 of the formed quadrilateral is regarded as an etching window. Then the etching advances only to the substrate 1102 positioned below the bottom surface 1107, and when a [111] sidewall 1108 is exposed, the etching is suppressed to form a truncated pyramidal structure 1109. A nozzle is thus manufactured.

YASU KINEI
BOKU KAGEHIRO
MINAMI MOTOMORI
KYO SOGEN

JP29182194A

February 12, 1997

November 25, 1994

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KANKOKU DENSHI TSUSHIN KENKYUSHO

B41J2/135; B44C1/22; B44C3/00; B81C1/00; G02B1/00; H01L21/02; H01L21/20; H01L21/306; H01L29/84; (IPC1-7): H01L21/306; B41J2/135; G02B1/00; H01L21/02; H01L29/84

JP6192865A
JP4125159A
JP5824503B2

Kazuko Tomita (1 outside)

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