Title:
ＭＥＭＳ素子の製造方法
Document Type and Number:
Japanese Patent JP7226683
Kind Code:
B2
Abstract:
To provide an MEMS element that has reduced influence from stress applied to a movable electrode film and a stationary electrode film from a handle substrate and a spacer, and to provide a method for manufacturing the same.SOLUTION: In an MEMS element, a handle substrate and a spacer joined to a movable electrode film and a stationary electrode film are formed into a doughnut shape having a uniform wall thickness, thereby preventing stress from being unevenly concentrated to the movable electrode film and the stationary electrode film from the handle substrate and the spacer.SELECTED DRAWING: Figure 7
Inventors:
Araki Shinichi
Application Number:
JP2018219998A
Publication Date:
February 21, 2023
Filing Date:
November 26, 2018
Export Citation:
Assignee:
New Japan Radio Microdevices Co., Ltd.
International Classes:
B81B3/00; B81C1/00; H04R19/04; H04R31/00
Domestic Patent References:
| JP2017042871A |
Foreign References:
| US20180002159 | ||||
| KR101566117B1 | ||||
| WO2017129957A1 |
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