Title:
酸化セリウム粒子の製造方法、研磨液の製造方法、及び基板の研磨法
Document Type and Number:
Japanese Patent JP5369610
Kind Code:
B2
Abstract:
To provide a production method capable of efficiently and stably obtaining cerium oxide particles capable of reducing polishing flaws, the cerium oxide particles obtained thereby, a polishing liquid containing the cerium oxide particles, and a polishing method using the same.
The production method of the cerium oxide particles comprises: (I) a step of heating and mixing cerium carbide and an organic acid to obtain a heated powder mixture; (II) a step of firing the heated powder mixture to obtain a cerium oxide powder; and (III) a step of pulverizing the cerium oxide powder to obtain the cerium oxide particles.
COPYRIGHT: (C)2010,JPO&INPIT
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Inventors:
Daisuke Hosaka
Yoshida Tetsuhei
Kanji Kane
Yoshida Tetsuhei
Kanji Kane
Application Number:
JP2008274168A
Publication Date:
December 18, 2013
Filing Date:
October 24, 2008
Export Citation:
Assignee:
Hitachi Chemical Co., Ltd.
International Classes:
C01F17/00; B24B37/00; C09K3/14; H01L21/304
Domestic Patent References:
| JP2000026840A | ||||
| JP7309622A |
Foreign References:
| WO2007123203A1 |
Attorney, Agent or Firm:
Hidekazu Miyoshi
Iwa Saki Kokuni
Kawamata Sumio
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu
Iwa Saki Kokuni
Kawamata Sumio
Masakazu Ito
Shunichi Takahashi
Toshio Takamatsu