Title:
プラズマ処理装置用電極板およびプラズマ処理装置用電極板の製造方法
Document Type and Number:
Japanese Patent JP7054046
Kind Code:
B2
Abstract:
To provide an electrode plate for a plasma processing apparatus, on which not only a surface but also an inner wall of a vent hole have high plasma resistance and are hard to be worn and torn.SOLUTION: A manufacturing method for an electrode plate for a plasma processing apparatus includes: a through hole formation step of forming on a base material plate a plurality of through holes having a taper part whose diameter increases from the inside of the base material plate to the outside thereof; a CVD step of depositing a coating material containing silicon carbide as its primary component on the base material plate having the through holes using Chemical Vapor Deposition method to fill the inside of the through holes with the coating material and coat the base material plate's surface to form a coating layer; and a vent hole formation step of forming a hole, which is concentric with and has a diameter smaller than that of each of the through holes, so that the hole penetrates the base material plate in the plate's thickness direction to form a plurality of vent holes.SELECTED DRAWING: Figure 1
Inventors:
Nomura Satoshi
Application Number:
JP2018017983A
Publication Date:
April 13, 2022
Filing Date:
February 05, 2018
Export Citation:
Assignee:
Mitsubishi Materials Corporation
International Classes:
C04B35/565; H01L21/3065; C04B41/87; C23C16/42; C23C16/509; H01L21/31
Domestic Patent References:
| JP2000058510A | ||||
| JP2150024A | ||||
| JP2014157944A | ||||
| JP2003051485A | ||||
| JP8227874A | ||||
| JP2016181385A |
Attorney, Agent or Firm:
Masakazu Aoyama