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Title:
ハロゲノアルキルナイトレートの製造方法
Document Type and Number:
Japanese Patent JP2008521770
Kind Code:
A
Abstract:
A process for preparing a compound of formula (I) X-(CH2)n-ONO2  (I) wherein: X is a halogen atom selected from Cl, Br, I; n is an integer from 3 to 6; said process comprising the slow addition of a compound of formula (II) X-(CH2)n-OH  (II) wherein X and n are as defined above to a nitrating agent selected from the group consisting of concentrated nitric acid/concentrated sulfuric acid (sulfonitric mixture), nitric acid alone, NaNO2 in trifluoroacetic acid, nitronium salts such as NO2BF4 and an organic solvent selected from the group consisting of CH2Cl2, CHCl3, CCl4, perfluorohexane, perfluoroheptane. The invention refers also to solutions containing: a compound of general formula (I) and a solvent selected from the group consisting of CH2Cl2, CHCl3, CCl4, perfluorohexane, perfluoroheptane, characterized in that the compound of formula (I) is present in a concentration not higher than 20% by weight.

Inventors:
Romano, Livorta
Finlander, peter
Application Number:
JP2007541926A
Publication Date:
June 26, 2008
Filing Date:
November 09, 2005
Export Citation:
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Assignee:
NICOX S.A.
International Classes:
C07C201/02; C07C203/04
Domestic Patent References:
JPS6064948A1985-04-13
JPS6064948A1985-04-13
JPH04503961A1992-07-16
Foreign References:
WO2004043898A12004-05-27
WO2004043898A12004-05-27
WO2004043897A12004-05-27
Other References:
JPN5007020698; KAWASHIMA: J. MED. CHEM. V36 N7, 1993, P815-819
JPN5007020698; KAWASHIMA: J. MED. CHEM. V36 N7, 1993, P815-819
JPN5007020700; OGAWA T: CHEMICAL AND PHARMACEUTICAL BULLETIN V41 N6, 199306, P1049-1054, PHARMACEUTICAL SOCIETY OF JAPAN
Attorney, Agent or Firm:
Shintaro Nogawa