To provide a photocurable resin composition for nanoimprint which can form microstructures of electronic parts and the like excellent in the line edge roughness and more economical with high accuracy and stably, and to provide a cured product thereof.

The manufacturing method of the microstructures, which obtains the microstructures by providing a nanoimprint processing for a photocurable resin composition for nanoimprint, comprises (1) the process wherein a film consisting of the photocurable resin composition for nanoimprint, which contains a curable compound containing a cationic polymerizable compound and/or a radical polymerizable compound, is formed on a support and the pattern is transferred with a press of a pressure 5-100 MPa using a nanostamper and (2) the process wherein the pattern-transferred film is cured to obtain the microstructures.