Title:
マスクアライメント方法、成膜方法、マスクアライメント装置、及び成膜装置
Document Type and Number:
Japanese Patent JP7450493
Kind Code:
B2
Abstract:
An objective of the present invention is to provide a mask alignment method which completes mask alignment within a short period of time. According to the present invention, the mask alignment method adjusts a relative position of a mask and a mask mounting part and comprises: a measurement process of measuring a relative position misalignment amount of the mask on the mask mounting part; a position adjustment process of relatively moving the mask with respect to the mask mounting part by a moving instruction amount corresponding to the measured position misalignment amount within a surface parallel with a mounting surface of the mask mounting part while the mask is separated from the mask mounting part; and a mounting process of mounting the relatively moved mask on the mask mounting part. Based on a predetermined condition, the moving instruction amount is corrected, and a moving instruction amount after the correction is used to perform the position adjustment process.
Inventors:
Hiroki Tomii
Kazunori Tani
Kotaro Torigata
Kazunori Tani
Kotaro Torigata
Application Number:
JP2020132998A
Publication Date:
March 15, 2024
Filing Date:
August 05, 2020
Export Citation:
Assignee:
Canon Tokki Corporation
International Classes:
C23C14/04; H05B33/10; H10K50/10
Domestic Patent References:
| JP2019081950A | ||||
| JP2008004358A | ||||
| JP10199784A | ||||
| JP2007046099A |
Foreign References:
| WO2007023553A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Shuwa Patent Office
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