Title:
基板処理装置および基板処理装置のガス切り替え方法
Document Type and Number:
Japanese Patent JP7450494
Kind Code:
B2
Abstract:
A substrate processing apparatus includes: a processing chamber configured to execute a processing on a substrate by an introduced gas; an exhaust chamber configured to exhaust a gas existing in the processing chamber; a partition plate having a plurality of gas passing holes for bringing the processing chamber and the exhaust chamber into communication with each other therethrough; a measuring instrument configured to measure a state in the processing chamber; a first pipe configured to connect the processing chamber and the measuring instrument; a second pipe configured to bring the exhaust chamber and the measuring instrument into communication with each other therethrough via a first valve; and a controller, wherein the controller is configured to control the substrate processing apparatus so as to control the first valve
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Inventors:
Nobumine Sasaki
Application Number:
JP2020138068A
Publication Date:
March 15, 2024
Filing Date:
August 18, 2020
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/3065
Domestic Patent References:
| JP2015119069A | ||||
| JP8074041A | ||||
| JP2002100608A | ||||
| JP2019161121A | ||||
| JP2007027496A | ||||
| JP2010258089A | ||||
| JP8031745A | ||||
| JP1262432A | ||||
| JP2006120822A | ||||
| JP2010186891A | ||||
| JP2007194361A | ||||
| JP2007027661A | ||||
| JP2001196313A |
Attorney, Agent or Firm:
Sakai International Patent Office