Title:
MASK FOR EXPOSURE
Document Type and Number:
Japanese Patent JPS54141573
Kind Code:
A
Abstract:
PURPOSE:To perform highly accurate alignment through simple operation without using any space holding device in mask alignment by a proximity method by constituting an exposure mask which gives a slight spacing between the exposure mask and substrate. CONSTITUTION:In a method of positioning an exposure mask original plate 3 on a semiconductor substrate 2 coated with photosensitive agents 1, the mask patterns 4 by the material cutting off exposure rays are formed on the mask original plate 3 which transmits exposure rays and further protrusions 5 which are thicker than the thickness of the patterns 4 and give a spacing between the mask orginal plate 3 and substrate 2 are provided in the specified positions of the portions excluding the regions forming the patterns 4. And the difference between the patterns 4 and protrusions 5 are selected within a range of 0.05 to 100mum, whereby the operation of the mask alignment by a proximity method is simplified and the highly accurate alignment is made possible.
Inventors:
SUDOU MASATOSHI
NISHIKUBO YOSHIAKI
NISHIKUBO YOSHIAKI
Application Number:
JP5052378A
Publication Date:
November 02, 1979
Filing Date:
April 26, 1978
Export Citation:
Assignee:
MATSUSHITA ELECTRONICS CORP
International Classes:
G03F1/60; H01L21/027; H01L21/302; (IPC1-7): H01L21/302
Domestic Patent References:
| JPS533069A | 1978-01-12 | |||
| JPS4936863B1 | 1974-10-03 | |||
| JPS532082A | 1978-01-10 |