Title:
MASK AND PROJECTION ALIGNER
Document Type and Number:
Japanese Patent JP3495983
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a mask which makes it possible to easily obtain images of high-resolution electronic circuit patterns and a projection aligner using the same.
SOLUTION: This mask is formed by fitting the surface side drawn with the circuit patterns of a mask substrate drawn with the circuit patterns with a transparent member for dust proofing across a supporting frame or directly. The transparent member is provided with correction means for correcting the change in the optical characteristics after deformation from an ideal shape.
Inventors:
Tsuneo Kanda
Application Number:
JP2000401228A
Publication Date:
February 09, 2004
Filing Date:
December 28, 2000
Export Citation:
Assignee:
Canon Inc
International Classes:
G02B13/22; G02B13/24; G03F1/62; G03F7/20; H01L21/027; G02B13/14; (IPC1-7): G03F1/14; G02B13/14; G02B13/22; G02B13/24; G03F7/20; H01L21/027
Domestic Patent References:
| JP2001117213A |
Attorney, Agent or Firm:
Yukio Takanashi
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