Title:
MATERIAL FOR FORMING PROTECTIVE FILM AND FORMING METHOD FOR RESIST PATTERN
Document Type and Number:
Japanese Patent JP2011227290
Kind Code:
A
Abstract:
To provide a material for forming a protective film which is capable of improving water repellency while suppressing a deterioration in alkali solubility of the protective film, and to provide a forming method for a resist pattern using the material for forming a protective film.
A material for forming a protective film contains an alkali-soluble polymer having a structural unit derived from a monomer represented by formula (A-1). In the formula, R0 represents a group expressed by formula (a-1) or formula (a-2), Q0 represents a divalent linkage group which may have a single bond or a fluorine atom, and R1 represents an organic group which may have a fluorine atom.
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Inventors:
SHIRAI YURIKO
YOSHIDA MASAAKI
NAMIKI TAKUMI
ISHIKAWA KIYOSHI
KOSHIYAMA ATSUSHI
YOSHIDA MASAAKI
NAMIKI TAKUMI
ISHIKAWA KIYOSHI
KOSHIYAMA ATSUSHI
Application Number:
JP2010096930A
Publication Date:
November 10, 2011
Filing Date:
April 20, 2010
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/11; C08F20/10; C08F32/00; G03F7/38; H01L21/027
Domestic Patent References:
| JP2009192784A | 2009-08-27 | |||
| JP2009134174A | 2009-06-18 | |||
| JP2010275498A | 2010-12-09 | |||
| JP2010271708A | 2010-12-02 | |||
| JP2010106139A | 2010-05-13 | |||
| JP2011085919A | 2011-04-28 | |||
| JP2009192784A | 2009-08-27 | |||
| JP2009134174A | 2009-06-18 | |||
| JP2010275498A | 2010-12-09 | |||
| JP2010271708A | 2010-12-02 | |||
| JP2010106139A | 2010-05-13 |
Foreign References:
| WO2011127014A1 | 2011-10-13 |
Attorney, Agent or Firm:
Masayuki Masabayashi