Title:
MATERIAL VAPOR DEPOSITION
Document Type and Number:
Japanese Patent JP3238663
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To easily and economically form a thin coating film on a substrate.
SOLUTION: This method is composed of a stage in which at least one stabilizing soln. of a preferable compd. and a solvent is produced, a stage in which a substrate 5 is arranged at the inside of a vacuum depositing chamber 2, a stage in which the mist of the stabilizing soln. is produced by using ultrasonic vibration and a stage in which the mist is flowed into the vacuum depositing chamber 2 proximately to the substrate 5 by using a nozzle device 8 in such a manner that the mist adheres onto the substrate 5 to form a layer of the stabilizing soln.
Inventors:
Pazu de Arajo Carlos A
Macmillan Rally Day
Roberts Tom L
Macmillan Rally Day
Roberts Tom L
Application Number:
JP23601498A
Publication Date:
December 17, 2001
Filing Date:
August 21, 1998
Export Citation:
Assignee:
SYMETRIX CORPORATION
International Classes:
C23C16/30; B05D1/00; B05D3/04; B05D7/24; C23C16/44; C23C16/448; C23C16/455; C23C16/46; C23C16/48; C23C16/52; C23C18/12; C23C26/02; C30B7/00; H01L21/02; H01L21/285; H01L21/288; H01L21/316; H01L41/24; H01L21/314; H05K3/10; (IPC1-7): C23C18/12; H01L21/288
Domestic Patent References:
| JP1257134A | ||||
| JP6452072A | ||||
| JP6452071A |
Attorney, Agent or Firm:
Yukihiko Hibiya