Title:
ダイノード電子放射表面上の汚染物質堆積を制御するための方法及び装置
Document Type and Number:
Japanese Patent JP7181288
Kind Code:
B2
Abstract:
Components of scientific analytical equipment, and particularly to methods for extending the operational lifetime or otherwise improving the performance of dynodes used in electron multipliers. The method includes: (i) increasing the secondary electron yield of a dynode and/or (ii) decreasing the rate of degradation of electron yield of a dynode, by exposing a dynode electron-emissive surface to an electron flux under conditions causing electron-impact induced removal of a contaminant deposited on the dynode electron-emissive surface. The conditions may be selected such that the electron-mediated removal is enhanced relative to a contaminant deposition process so as to provide a net decrease in the rate of contaminant deposition and/or a decrease in the amount of contaminant present on the dynode electron-emissive surface.
Inventors:
Shields, Wayne
Shanley, Toby
Shanley, Toby
Application Number:
JP2020515258A
Publication Date:
November 30, 2022
Filing Date:
August 29, 2018
Export Citation:
Assignee:
Adapters Solutions Proprietary Limited
International Classes:
H01J43/10
Domestic Patent References:
| JP2291658A |
Foreign References:
| US20160035550 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Osamu Miyazaki
Tadahiko Ito
Osamu Miyazaki
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