Title:
化合物、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6996116
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having good line edge roughness.SOLUTION: The resist composition contains a resin containing a structural unit having an acid-labile group, an acid generator, and a compound represented by formula (I0) [where Rand Reach independently represent a hydrogen atom or a 1-6C alkyl group; Arepresents a 1-6C alkanediyl group; Xrepresents *-O-, *-CO-O-, *-O-CO-, or *-O-CO-O-, provided that * represents a bonding position to A; and Rrepresents a 3-18C alicyclic saturated hydrocarbon group which may have a substituent, provided that -CH- contained in the alicyclic saturated hydrocarbon group may be substituted with -O-, -SO-, or -CO-].SELECTED DRAWING: None
Inventors:
Yoshida Isao
Shingo Fujita
Koji Ichikawa
Shingo Fujita
Koji Ichikawa
Application Number:
JP2017107503A
Publication Date:
January 17, 2022
Filing Date:
May 31, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C07C219/12; C07D321/10; C08F220/28; G03F7/039; G03F7/20
Domestic Patent References:
| JP2007041146A | ||||
| JP2017044929A |
Foreign References:
| WO2013172239A1 | ||||
| WO2009020035A1 | ||||
| US20110070542 | ||||
| KR1020110046332A |
Other References:
Lisa T.Kanerva et al.,Studies on the Chemo and Enantio-selectivity of the Enzymatic Monoacylations of Amino Alcohols,Acta Chemica Scandinavica,1992年,46,1101-1105
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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