Title:
ポリシルセスキオキサングラフト共重合体の製造方法、粘着剤および粘着シート
Document Type and Number:
Japanese Patent JP4963781
Kind Code:
B2
Abstract:
The present invention provides a process for producing a polysilsesquioxane graft polymer (1) which includes applying ionizing radiation or heat to a mixture including a polysilsesquioxane compound (2) and a vinyl compound (3), a polysilsesquioxane compound including an iniferter group, and a pressure-sensitive adhesive and a pressure-sensitive adhesive sheet using the polymer. According to the present invention, a process for producing a polysilsesquioxane graft polymer which may be used as a pressure-sensitive adhesive exhibiting excellent heat resistance and cohesive force, and the like are provided. In the formula, A represents a linking group, R1 represents a hydrocarbon group which may have a substituent, R2 represents a hydrogen atom or the like, R3 represents a polar group or the like, R4 represents a hydrogen atom or the like, k1 to k3 represent arbitrary positive integers, 1 to n represent zero or an arbitrary positive integer (excluding the case where “m=n=0”), and Q represents an iniferter group.
Inventors:
Kumon Kento
Kageyama Toshifumi
Kimura Atsuko
Toshio Sugisaki
Moriya Osamu
Kageyama Toshifumi
Kimura Atsuko
Toshio Sugisaki
Moriya Osamu
Application Number:
JP2004049894A
Publication Date:
June 27, 2012
Filing Date:
February 25, 2004
Export Citation:
Assignee:
LINTEC CORPORATION
International Classes:
C08F283/12; C08G77/392; C09J7/38; C09J151/08; C09J183/10
Domestic Patent References:
| JP9216922A | ||||
| JP9324054A | ||||
| JP6256717A | ||||
| JP8100035A |
Attorney, Agent or Firm:
Haruhito Oishi