Title:
グラフェン構造体を形成する方法および装置
Document Type and Number:
Japanese Patent JP7178935
Kind Code:
B2
Abstract:
A method of forming a graphene structure, includes: providing a substrate; performing a preprocessing by supplying a first processing gas including a carbon-containing gas to the substrate while heating the substrate, without using plasma; and after the preprocessing, forming the graphene structure on a surface of the substrate through a plasma CVD using plasma of a second processing gas including a carbon-containing gas.
Inventors:
Ryota Ifuku
Takashi Matsumoto
Masahito Sugiura
Takashi Matsumoto
Masahito Sugiura
Application Number:
JP2019049093A
Publication Date:
November 28, 2022
Filing Date:
March 15, 2019
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C16/26; C01B32/186; C23C16/02; H01L21/205; H05H1/46
Domestic Patent References:
| JP2017521339A | ||||
| JP2016520032A | ||||
| JP2013100205A | ||||
| JP2014231455A |
Attorney, Agent or Firm:
Hiroshi Takayama