Title:
METHOD AND APPARATUS FOR TREATING GAS CONTAINING FLUOROCOMPOUND AND CARBON MONOXIDE
Document Type and Number:
Japanese Patent JP3889932
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method and apparatus for efficiently treating a gas which contains a fluorocompound and carbon monoxide and is discharged e.g. in the step of dry cleaning the inside surface of a semiconductor production apparatus in the semiconductor industry or in the step of etching various formed films such as an oxide film.
SOLUTION: This method, for treating a gas containing a fluorocompound and carbon monoxide, contains the step of contacting the gas with O2 and H2O at 850°C or higher to oxidize CO to CO2 and the step of contacting the treated gas with γ-alumina at 600-900°C to decompose the fluorocompound.
Inventors:
Yoichi Mori
Application Number:
JP2001026750A
Publication Date:
March 07, 2007
Filing Date:
February 02, 2001
Export Citation:
Assignee:
Ebara Corporation
International Classes:
B01D53/68; B01D53/34; B01J21/04; B01D53/86; C07B35/06; C07B37/06; C07C19/08; (IPC1-7): B01D53/86; B01J21/04; C07B35/06; C07B37/06; C07C19/08
Domestic Patent References:
| JP11070322A | ||||
| JP11319485A | ||||
| JP10286434A | ||||
| JP2001293335A |
Foreign References:
| WO2000009258A1 |
Attorney, Agent or Firm:
Kazuo Shamoto
Tadahiko Kurita
Shurin Sakurai
Kiyoshi Murakami
Shinya Hosokawa
Takako Koiso
Tadahiko Kurita
Shurin Sakurai
Kiyoshi Murakami
Shinya Hosokawa
Takako Koiso