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Patent Searching and Data


Title:
METHOD FOR CONTROLLING SI CONCENTRATION OF HIGH-SI CONCENTRATION STEEL STRIP
Document Type and Number:
Japanese Patent JPH0790544
Kind Code:
A
Abstract:

PURPOSE: To automatically and easily make the Si concn. of a continuously produced high-Si concn. steel strip coincide with a target Si concn. with high accuracy regardless of a fluctuation in the thickness of the steel strip.

CONSTITUTION: The thickness of the steel strip 1 on the inlet side of a siliconizing furnace 2 is measured online by a thickness gage 7. A calculator 8 calculates the thickness difference between the normal thickness of the steel strip 1 and the actually measured thickness by the thickness gage 7. The finish Si concn. of the steel strip 1 is calculated from this thickness difference and the concn. difference between this finish Si concn. and the target Si concn. is calculated. The correction rate of a siliconizing treatment gas is calculated in accordance with this concn. difference. The calculator 8 sends such an opening degree command as to make the corrected gas flow rate coincide with the actually measured flow rate by a flow rate detector 6 to a flow rate regulating valve 5.


Inventors:
INOUE TOSHIYUKI
HIROKAWA TAKASHI
YAMAJI TSUNEHIRO
Application Number:
JP26434393A
Publication Date:
April 04, 1995
Filing Date:
September 28, 1993
Export Citation:
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Assignee:
NIPPON KOKAN KK
International Classes:
C23C10/08; C21D9/46; (IPC1-7): C23C10/08
Attorney, Agent or Firm:
Natsuo Shiotani