PURPOSE: To accurately inject an electron beam on the specified position of a vapor-deposition material by adding a functional correction consisting of the information on the horizontal deflection angle to the vertical deflection angle of an electron beam, based on the incident position of the electron beam.
CONSTITUTION: The vertical and horizontal deflection angles of an electron beam from the injection port 11 of an electron beam gun are controlled by a deflection coil 12 so that the beam describes a path 13. The beam is injected into the vapor-deposition material 15 in a water-cooled copper crucible 14 based on the preset incident pattern to scan the material, along the line of magnetic force of an electromagnet 16. In this method for controlling heating by the electron beam, the incident position of the beam in the preset vertical deflection angle and bisymmetrically oscillated horizontal deflection angle is previously obtained. A functional correction consisting of the information on the horizontal deflection angle is added to the vertical deflection angle based on the incident position, and correction is performed. The control is conducted based on the corrected deflection angle, and the desired incident pattern of the beam is obtained.
ISHII TOSHIO
SUGIYAMA SHUNICHI
KIBE HIROSHI
MATSUI KOJI
| JPS609871A | 1985-01-18 |