Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD AND DEVICE FOR ELECTRON BEAM IRRADIATION
Document Type and Number:
Japanese Patent JP2002006100
Kind Code:
A
Abstract:

To provide a method and device for electron beam irradiation of high process efficiency and productivity where a both-side irradiation is efficiently performed with a single electron beam accelerator.

There are provided an electron beam irradiation device which circulates in a shield space for shielding X-ray generated secondary by electron beam irradiation while performing one-side irradiation with the object sidewise, and an object translation means which, provided between a lower stream side and an upper stream side in transportation direction of irradiation point, returns the object from the lower stream side to the upper stream side while translating it. An object, after irradiated by one surface, returns onto the upper stream side of irradiation point by the translation means, and an opposite surface which is not irradiated is allowed to face the electron beam irradiation side. Thus, both surfaces of the object is irradiated during two rounds.


Inventors:
YAMAKAWA TAKASHI
Application Number:
JP2000191802A
Publication Date:
January 09, 2002
Filing Date:
June 26, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MITSUBISHI HEAVY IND LTD
International Classes:
G21F3/00; A61L2/08; G21K5/00; G21K5/04; G21K5/10; (IPC1-7): G21K5/10; A61L2/08; G21F3/00; G21K5/00; G21K5/04
Attorney, Agent or Firm:
Masahisa Takahashi (1 person outside)