Title:
METHOD AND DEVICE FOR MEASUREMENT OF POSITION OF EXPOSED SURFACE FOR ELECTRON BEAM EXPOSURE
Document Type and Number:
Japanese Patent JPS5670633
Kind Code:
A
Abstract:
PURPOSE:To enable precise measurement of the position on the exposed surface in height direction by scanning the exposed surface of material to be exposed in a predetermined range with two different types of electron beams in projecting angle and detecting information obtained from the exposed surface. CONSTITUTION:The first and second deflectors 7 and 8 are controlled, and the range from a point P1 to a point O1 on the material 6 to be exposed is scanned with two electron beams (at angles phi and theta) of different projecting angles. Thus, secondary electrons from the material 6 are detected by an electron detector, different pieces of information from the detector are stored in different registers, and the position in height direction on the exposed surface is measured in accordance with the existence or absence of the displacement of both the signals obtained therefrom. Thus, the position in height direction on the exposed surface can be accurately measured without provision of a mark on the exposed surface.
Inventors:
WATANABE EIJI
Application Number:
JP14819779A
Publication Date:
June 12, 1981
Filing Date:
November 15, 1979
Export Citation:
Assignee:
NIPPON ELECTRON OPTICS LAB
International Classes:
G03F7/20; G03F1/00; G03F1/76; G03F1/78; G03F7/26; G03F9/00; H01J37/30; H01L21/027; (IPC1-7): G03C5/00; G03F9/00