Title:
METHOD AND EQUIPMENT FOR CLEANING VACUUM LINE OF CVD SYSTEM
Document Type and Number:
Japanese Patent JPH09181063
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To prevent the accumulation of particulate matters and other substances substantially in an exhaust line by capturing granular residue and other substances collected n a vacuum line during deposition operation in a collection chamber and removing the granular residue and other substances in plasma formed in the downstream of a reaction chamber. SOLUTION: When a deposition gas is discharged through a vacuum line 31 from a vacuum chamber 15, residue is deposited. Granulate matters and residue may also be removed by operating a downstream plasma cleaning device (a DPA) 40. The DPA 40 generates a voltage-power field, in which the molecules of residue deposited on an internal surface and the molecules of an exhaust gas passed through the DPA 40 are excited and brought to a plasma state. The process in which substances in the DPA 40 are decomposed by plasma and changed into gaseous products and by-products is promoted, and these products and by-products are exhausted forcibly through a fore-line, so that granular deposits and the accumulation of residue can be prevented.
Inventors:
BEN PAN
DEIBUITSUDO SHIYUN
UIRIAMU ENU TEIRAA JIYUNIA
SEBASUCHIYAN RAU
MAAKU FUODAA
DEIBUITSUDO SHIYUN
UIRIAMU ENU TEIRAA JIYUNIA
SEBASUCHIYAN RAU
MAAKU FUODAA
Application Number:
JP27400896A
Publication Date:
July 11, 1997
Filing Date:
September 25, 1996
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
B01J19/24; C23C16/44; C23C16/50; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/31; C23C16/44; C23C16/50; H01L21/205; H01L21/3065
Attorney, Agent or Firm:
Yoshiki Hasegawa (3 outside)