Title:
METHOD FOR FORMING PATTERNED INSULATING FILM
Document Type and Number:
Japanese Patent JP2003131375
Kind Code:
A
Abstract:
To develop a method for forming a patterned insulating film having high transmittance in the visible region and having high heat resistance and high dry etching durability and to improve the performance of a display device.
A radiation-sensitive resin composition containing an alkali- soluble copolymer consisting of indene and maleimide, a 1,2-naphthoquinone diazide compound and a crosslinking agent is used. By this method, the luminance of an LCD device and the driving rate of the liquid crystal can be improved.
Inventors:
YASUKAWA AKIKO
UCHINO MASAICHI
HAYASHI NOBUAKI
NISHIO TETSUYA
UCHINO MASAICHI
HAYASHI NOBUAKI
NISHIO TETSUYA
Application Number:
JP2001327121A
Publication Date:
May 09, 2003
Filing Date:
October 25, 2001
Export Citation:
Assignee:
HITACHI LTD
International Classes:
G03F7/032; C08F222/40; C08F232/08; G03F7/023; H01L21/027; H01L21/312; (IPC1-7): G03F7/032; C08F222/40; C08F232/08; G03F7/023; H01L21/027; H01L21/312
Attorney, Agent or Firm:
Sakuta Yasuo
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