Title:
METHOD FOR MANUFACTURE OF SENSOR AND SENSOR
Document Type and Number:
Japanese Patent JPH06349806
Kind Code:
A
Abstract:
PURPOSE: To control an etching step in a manufacturing process more accurately, and obtain high dimensional accuracy. CONSTITUTION: A layer plate 5 is formed. In this case, an etching layer 3 is laid out between an upper layer 1 and a lower layer 2, which are made of single-crystal silicon, and a groove 4 extending to the etching layer 3 is worked and shaped, thereby forming a predetermined structure in the upper layer 1. The etching layer 3 located below at least a part of the structure is removed.
Inventors:
GERUHARUTO BENTSU
IRI MAREKU
FURANKU BANTEIIN
HORUSUTO MIYUNTSUERU
FURANTSU RERUMAA
MIHIYAERU OTSUFUENBERUKU
ANDOREA SHIRUPU
IRI MAREKU
FURANKU BANTEIIN
HORUSUTO MIYUNTSUERU
FURANTSU RERUMAA
MIHIYAERU OTSUFUENBERUKU
ANDOREA SHIRUPU
Application Number:
JP9454594A
Publication Date:
December 22, 1994
Filing Date:
May 06, 1994
Export Citation:
Assignee:
BOSCH GMBH ROBERT
International Classes:
G01P15/08; G01P15/125; H01L21/306; H01L29/84; (IPC1-7): H01L21/306; H01L29/84
Attorney, Agent or Firm:
Toshio Yano (2 outside)