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Title:
METHOD FOR MANUFACTURING N-ISOPROPYLGLYCINE
Document Type and Number:
Japanese Patent JP2002047258
Kind Code:
A
Abstract:

To provide a method for manufacturing high-purity N-isopropylglycine little in contents of organic and inorganic impurities advantageously on an industrial scale, and further to provide a compound useful as an intermediate for manufacturing the high-purity N-isopropylglycine and a method for manufacturing the compound.

A method for manufacturing N-isopropylglycine comprises the desalting treatment of N-isopropylglycine alkali metal salt. A method for manufacturing N-isopropylglycine alkali metal salt comprises the following steps: glycolonitrile is made to react with isopropylamine to obtain N- isopropylglycinonitrile; and the N-isopropylglycinonitrile is hydrolyzed with an alkali metal hydroxide or the like. N-isopropylglycine alkali metal salt is also provide.


Inventors:
SHIBAFUJI ATSUSHI
YAMAMOTO TORU
SAITO MAKOTO
Application Number:
JP2000232962A
Publication Date:
February 12, 2002
Filing Date:
August 01, 2000
Export Citation:
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Assignee:
SHOWA DENKO KK
International Classes:
C07C227/40; C07B61/00; C07C227/26; C07C229/06; (IPC1-7): C07C227/40; C07C227/26; C07C229/06
Domestic Patent References:
JPH0789912A1995-04-04
JPS5446717A1979-04-12
JPS5459224A1979-05-12
JPS55122746A1980-09-20
JPS4913115A1974-02-05
JPS6230742A1987-02-09
JPS62277348A1987-12-02
Attorney, Agent or Firm:
Shinji Kakinuma



 
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