レジスト組成物及びレジストパターンの製造方法

Title:

レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP5898520

Kind Code:

B2

Abstract:

A resist composition includes (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator having an acid-labile group. wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom.

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Inventors:

Koji Ichikawa
Norifumi Yamaguchi
Suzuki Yuki

Application Number:

JP2012033535A

Publication Date:

April 06, 2016

Filing Date:

February 20, 2012

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

G03F7/039; C07D233/60; C07D307/33; C07D307/93; C07D327/06; C08F20/24; C08F20/26; G03F7/004

Domestic Patent References:

JP2011095623A
JP2011128226A
JP2011126944A
JP2012113302A
JP2012141614A
JP2013513827A

Foreign References:

WO2011034176A1

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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