Title:
レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7099030
Kind Code:
B2
Abstract:
To provide a composition capable of producing a resist pattern with good line edge roughness (LER), and a method for producing a resist pattern.SOLUTION: The resist composition contains an acid generator containing a salt represented by formula (I), a resin having an acid-labile group, and a salt which generates an acid having an acidity lower than that of an acid generated from the acid generator. [In the formula (I), Q, Q, Qand Qeach independently represent a fluorine atom or the like; R, R, Rand Reach independently represent a hydrogen atom or the like; z and z1 each independently represent an integer of 0-6; Xand Xeach independently represent -CO-O- or the like; Land Leach independently represent a single bond, a C1-28 divalent saturated hydrocarbon group, or the like; and Zand Z1each independently represent an organic cation.]SELECTED DRAWING: None
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Inventors:
Yukako Adachi
Hiroshi Nakamura
Koji Ichikawa
Hiroshi Nakamura
Koji Ichikawa
Application Number:
JP2018086267A
Publication Date:
July 12, 2022
Filing Date:
April 27, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C07C309/17; C07C381/12; C09K3/00; G03F7/039; G03F7/20
Domestic Patent References:
| JP2015206932A | ||||
| JP2005122133A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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