To provide a method of manufacturing a stamper for nanoimprinting which enables formation of finer patterns and can be executed inexpensively.

The method of manufacturing the stamper for nanoimprinting includes at least a step (a) of forming a thin metal film on a surface of a substrate, a step (b) of forming a resist layer on the surface of the thin metal film, a step (c) of forming an relief pattern on the resist layer using an electron beam lithography method, a step (d) of etching the thin metal film according to the relief pattern of the resist layer to form a pattern-shaped metal mask, and a step (e) of forming an relief pattern on the substrate according to the metal mask. By side-etching the thin metal film in the step (d), the width of protrusions formed in the substrate in the step (e) is reduced to be smaller than the width of the recess of the relief pattern formed in the step (c).