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Patent Searching and Data


Title:
METHOD OF MANUFACTURING TRANSISTOR ARRAY SUBSTRATE AND METHOD OF MANUFACTURING OPTOELECTRIC DEVICE
Document Type and Number:
Japanese Patent JP2001237429
Kind Code:
A
Abstract:

To provide a method of manufacturing a TFT array substrate and an optoelectric device, in which cost can be reduced by performing an highly accurate inspection equivalent to a lighting inspection in a stage of TFT array substrate.

In a manufacturing method of a liquid crystal device, in the stage of completion of manufacturing the TFT array 200, the substrate is checked for a operation before a panel is assembled. That is, a data drive circuit 60 and a scanning line drive circuit 70 are supplied with power or signals from an input/output terminal 45 of the TFT array substrate 200 to actuate TFTs 10A, 10B and 10C, and it is inspected as to whether a very weak light with a wavelength between a visual region and a near-infrared region is generated on the TFT array substrate 200 by emission microscope.


Inventors:
HIRAIWA TAKU
Application Number:
JP2000046388A
Publication Date:
August 31, 2001
Filing Date:
February 23, 2000
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G02F1/13; G02F1/136; G02F1/1368; H01L29/786; (IPC1-7): H01L29/786; G02F1/13
Attorney, Agent or Firm:
Kisaburo Suzuki (2 outside)