METHOD OF PATTERN FORMATION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICES, AND ELECTRONIC DEVICES

Title:

METHOD OF PATTERN FORMATION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICES, AND ELECTRONIC DEVICES

Document Type and Number:

Japanese Patent JP2014089404

Kind Code:

A

Abstract:

To provide a method of pattern formation, having excellent uniformity of local pattern dimension (Local CDU, nm) and circularity in formation of a fine pattern such as a hall pattern having a hole size of 75 nm or less (preferably 45 nm or less) by an organic developer; an active light-sensitive or radiation-sensitive resin composition and a resist film used for the same; a method of manufacturing electronic devices using these; and electronic devices.

Provided is a method of pattern formation comprising steps of: (1) forming a film by an active light-sensitive or radiation-sensitive resin composition containing the following resin (A) and the following compound (B): (A) a resin containing a repeating unit (a0) having a -SO₂- group and a repeating unit (a1) having a group which decomposes by an action of an acid to generate a polar group, wherein a molar average value of Clog P values of each monomer corresponding to each repeating unit except the repeating unit (a0) is 2.0 or more; (B) a compound which generates an acid by irradiation of active light or radiation; (2) exposing the film; (3) and forming a negative-type pattern by developing the exposed film by a developer containing an organic solvent.

More Like This:

WO2017008442	LUMINESCENT COMPLEX, LUMINESCENT MATERIAL, DISPLAY SUBSTRATE, PREPARATION METHOD AND DISPLAY DEVICE
JPH1124271	HIGHLY HEAT-RESISTANT RADIATION SENSITIVE RESIST COMPOSITION
JPH04179956	RESIST COMPOSITION FOR FORMING PATTERN AND FINE PATTERN FORMING METHOD

Inventors:

MATSUDA TOMOKI

Application Number:

JP2012240415A

Publication Date:

May 15, 2014

Filing Date:

October 31, 2012

Export Citation:

Click for automatic bibliography generation Help

Assignee:

FUJIFILM CORP

International Classes:

G03F7/038; G03F7/004; G03F7/039; H01L21/027

Domestic Patent References:

JP2012173419A	2012-09-10
JP2012168334A	2012-09-06
JP2011191727A	2011-09-29
JP5035466B1	2012-09-26
JP2013163652A	2013-08-22

Attorney, Agent or Firm:

Takeshi Takamatsu
Toshiyuki Ozawa
Hasegawa Hiromichi

Previous Patent: METHOD FOR FABRICATING SEMICONDUCTOR OPTICAL ELEMENT

Next Patent: HARD COAT COMPOSITION AND HARD COAT MATERIAL