To provide a method for processing a photosensitive material in which accumulation of sticking matter on a squeeze roller and a turn guide of a crossover rack in a processing tank in a stabilizing step or a rinsing step is prevented, splotching and scratching of the photosensitive material are prevented, the load on maintenance such as rack cleaning work by a worker is reduced, and sticking matter can be scrubbed out with an inexpensive automatic wet scrubber without requiring a complicated expensive jet mechanism.

In the method, a stabilizing composition or a rinsing composition used in a stabilizing step or a rinsing step contains a compound represented by formula (I), and a photosensitive material processing apparatus is equipped with a rack automatic wet scrubber for scrubbing a squeeze roller or a turn guide of a crossover rack disposed at the outside of liquid to guide and transport the photosensitive material between adjacent processing tanks.