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Title:
METHOD FOR PRODUCING MONOFLUOROMETHANE
Document Type and Number:
Japanese Patent JP2013112610
Kind Code:
A
Abstract:

To provide a method for removing ethylene contained in monofluoromethane without relying on distillation, in view of the fact that: in producing monofluoromethane in a vapor-phase reaction irrespective of raw materials and reaction mechanism, thermodynamically stable olefins as well as unreacted raw materials and perfluorides are formed as byproducts; particularly, in a monofluoromethane production method by a process of fluorinating a methyl-containing compound under thermal decomposition, relatively large amounts of unsaturated compounds such as ethylene are formed; wherein, as to ethylene as representative (boiling point: -104°C), although its boiling point is relatively far from that of monofluoromethane (boiling point: -78.2°C), distillation at low temperature or under pressure is inevitable for removing it, leading to limitations in terms of relevant equipment.

A method for producing monofluoromethane is provided, including a step of bringing a monofluoromethane composition containing at least ethylene into contact with sulfuric acid.


Inventors:
OKAMOTO MASAMUNE
TAKADA NAOKADO
IMURA HIDEAKI
Application Number:
JP2011256903A
Publication Date:
June 10, 2013
Filing Date:
November 25, 2011
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD
International Classes:
C07C17/38; C07C19/08
Attorney, Agent or Firm:
Yoshiyuki Nishi