To provide a method of producing a pattern-formed structure in which a high-precision pattern formation is possible in the production of the pattern-formed structure and the cost and environmental load are reduced.

The method for producing a pattern-formed structure includes a substrate preparation step for a pattern-formed structure, in which a substrate for a pattern-formed structure is prepared, the substrate having a base body and a functional thin film formed on the base body, the thin film to be decomposed and removed due to the action of a photocatalyst and having functional properties in the film; and a pattern forming step of, after disposing a photocatalyst-containing layer side substrate having a base body and a photocatalyst-containing layer containing a photocatalyst, leaving a clearance of not more than 200 m between the photocatalyst-containing layer and the functional thin film; then irradiating the substrates with the energy from a predetermined direction, to decompose and remove the functional thin film along the pattern to form the pattern.