Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP5763433
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide: a salt excellent in exposing margin (EL) and mask error factor (MEF) when forming a resist pattern; an acid generator including the salt; and a resist composition including the acid generator.SOLUTION: The salt is represented by a formula (I), the acid generator includes the salt, and the resist composition includes the acid generator. Here, Ris a saturated hydrocarbon group which may have a substitutional group or an aromatic hydrocarbon group, Rto Rare each independently a hydrogen atom, a halogen atom, a hydroxy group, an alkyl group, or an alkoxy group. Rand Rare each independently a fluorine atom or a perfluoroalkyl group, Lis a single bond or a divalent saturated hydrocarbon group, and Y is an aliphatic hydrocarbon group which may have a substitutional group or a saturated cyclohydrocarbon group which may have a substitutional group.
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2011134832A
Publication Date:
August 12, 2015
Filing Date:
June 17, 2011
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07D233/60; C07D279/36; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2003149800A | ||||
| JP2000053601A | ||||
| JP10274844A | ||||
| JP6242606A | ||||
| JP60175046A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation