塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Japanese Patent JP7091874

B2

To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.SOLUTION: The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hydrogen atom or the like; z represents an integer of 0-6; when z is 2 or more, a plurality of R's and R's may be the same as or different from each other; Xrepresents *-CO-O-, *-O-CO-, *-O-CO-O- or -O-; Lrepresents an optionally substituted C1-36 divalent hydrocarbon group or the like; Rand Reach independently represent a hydrogen atom or the like; Lrepresents a single bond or the like; Rrepresents an optionally substituted C6-24 aromatic hydrocarbon group; and Zrepresents an organic cation].SELECTED DRAWING: None

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Tatsuro Masuyama
Yamaguchi Norifumi
Koji Ichikawa

JP2018118556A

June 28, 2022

June 22, 2018

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Sumitomo Chemical Co., Ltd.

C07C309/17; C07C309/12; C07C381/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20

JP2012193170A
JP2014215548A

Toru Nakayama
Toru Sakamoto

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