Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7091875
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern with good line edge roughness (LER), and a resist composition containing the salt.SOLUTION: The salt is represented by formula (I) [where Qand Qeach independently represent a fluorine atom or the like; Rand Reach independently represent a hydrogen atom or the like; z represents an integer of 0-6; Xrepresents *-CO-O- or the like; Lrepresents a single bond or the like; Ar represents an optionally substituted C6-36 divalent aromatic hydrocarbon group or the like; Rrepresents a C1-6 hydrocarbon group or the like; Rrepresents a hydrogen atom or a C1-6 hydrocarbon group; Rrepresents an optionally substituted C1-24 hydrocarbon group or the like; and Zrepresents an organic cation].SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Yamaguchi Norifumi
Koji Ichikawa
Yamaguchi Norifumi
Koji Ichikawa
Application Number:
JP2018118557A
Publication Date:
June 28, 2022
Filing Date:
June 22, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C309/12; C07C381/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014197168A | ||||
| JP2014067031A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto