Title:
METHOD FOR REMOVING METAL ION IMPURITY FROM LIQUID FLOW
Document Type and Number:
Japanese Patent JP2000015001
Kind Code:
A
Abstract:
To provide a method for effectively removing metal ion impurities from liquid flow.
Metal ion impurities are removed from liquid flow in a process incorporating such a step that the liquid flow is brought into contact with a new crystalline molecular sieve which has crystalline structure being alternate growth of pharmacosiderite and SiTiNAKite structure, in the absorption conditions. This molecular sieve is shown in the following empirical formula. A((4-4X)/n)(MXTil-zGey)4(Ge1-pSip)qOr. Wherein, A is a cation of sodium or potassium or the like. M is metal of niobium or tantalum or the like. The molecular sieve is especially effective in the case of removing cesium and strontium from aqueous flow.
Inventors:
ROBERT L BEDARD
Application Number:
JP16675498A
Publication Date:
January 18, 2000
Filing Date:
June 15, 1998
Export Citation:
Assignee:
UOP INC
International Classes:
B01D15/00; B01J20/10; C01B39/00; (IPC1-7): B01D15/00; B01J20/10; C01B39/00
Attorney, Agent or Firm:
Morio Sada