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Title:
METHOD FOR TREATING USED HEAT DEVELOPABLE MATERIAL
Document Type and Number:
Japanese Patent JP2002031872
Kind Code:
A
Abstract:

To rapidly recover a base and silver from a heat developable material in high yields and to obtain an original starting material in a high yield by separating a coating on the PET base of a heat developable material and converting the PET to a supercritical fluid.

In the method for treating a used heat developable material containing photosensitive silver halide grains, an organic silver salt, a reducing agent and a binder on the base, the base is separated from the heat developable material by a method comprising 1 a step for cutting the heat developable material into chips of 0.1 mm2 to 100 cm2 width (expressed in terms of area), 2 a step for immersing the chips in acidic or alkaline water containing an oxidizing agent at 60-140°C to remove a coating from the base within 1 min to 8 hr, 3 a step for separating the base from the coating with a filter and 4 a step for drying the separated base with hot air at 40-100°C.


Inventors:
HANIYU TAKESHI
NISHIWAKI SHU
MITSUHASHI TAKESHI
Application Number:
JP2000217501A
Publication Date:
January 31, 2002
Filing Date:
July 18, 2000
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
B01D11/00; B01D21/01; B09B3/00; B09B5/00; B29B17/00; B29B17/04; C02F1/56; G03C1/498; G03C11/24; G03C5/00; (IPC1-7): G03C1/498; B01D11/00; B01D21/01; B09B3/00; B09B5/00; B29B17/00; C02F1/56; G03C5/00; G03C11/24