COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

COMPOUND, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2021188041

Kind Code:

A

Abstract:

To provide a compound capable of producing a resist pattern having good CD uniformity (CDU), a resin, and a resist composition containing the same.SOLUTION: The compound represented by formula (I), the resin, and the resist composition are provided. [R5 represents a hydrogen atom, a C2-6 alkylcarbonyl group or an acid-labile group; and m2 represents 1-4, m4 represents 0-3, and m5 represents 1 or 2, provided that 2≤m2+m4+m5≤5.]SELECTED DRAWING: None

Inventors:

MASUYAMA TATSURO
NAKAGAWA TAKUYA
ICHIKAWA KOJI

Application Number:

JP2021085462A

Publication Date:

December 13, 2021

Filing Date:

May 20, 2021

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C08F20/30; C07C69/653; G03F7/004; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Shinki Global IP Patent Corporation

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