Title:
N-VINYLFORMAMIDE COMPOSITION
Document Type and Number:
Japanese Patent JP3412167
Kind Code:
B2
Abstract:
PURPOSE: To obtain an N-vinylformamide composition, containing formic acid in the N-vinylformamide, excellent in preservation stability and useful as a raw material for polymerizable monomers.
CONSTITUTION: The composition is obtained by including 1-250pm formic acid and further, as necessary, 10-10000ppm antioxidant (e.g. 2,6-di-t-butyl-p-cresol) in N-vinylformamide. This composition is preferably preserved in a hermetically sealed container at ≤30°C in an inert gas atmosphere so as to maintain the formic acid content of the N-vinylformamide at ≤250ppm. The increase in the content of the formic acid causing cationic polymerization can be suppressed by specifying the content of the formic acid and further adding the specific antioxidant thereto. As a result, the deterioration in both the purity of the N-vinylformamide and the polymerization activity during the preservation for a long period can be suppressed.
Inventors:
Shigeru Sawayama
Koichi Sato
Koichi Sato
Application Number:
JP23385392A
Publication Date:
June 03, 2003
Filing Date:
September 01, 1992
Export Citation:
Assignee:
Dia Nitrix Co., Ltd.
International Classes:
C07C231/22; C07C233/03; C07C233/09; C08F26/00; C08F26/02; C09K15/08; C09K15/18; C09K15/30; (IPC1-7): C07C231/22; C07C233/03; C08F26/02; C09K15/08; C09K15/18; C09K15/30
Domestic Patent References:
| JP63264559A | ||||
| JP2270846A | ||||
| JP61289068A |
Attorney, Agent or Firm:
Koji Hasegawa