Title:
PROCESS FOR PRODUCING ACID SENSITIVE POLYMER AND PHOTO RESIST STRUCTURE
Document Type and Number:
Japanese Patent JP2501292
Kind Code:
B2
Abstract:
PURPOSE: To form a positive photo resist exhibiting high sensitivity and resolution and capable of developing in an alkaline aqueous solution free from metal ions by adding a photosensitive acid generator to an arylsilsesquioxane polymer with acid sensitive pendant groups.
CONSTITUTION: By adding a photosensitive acid generator (preferably trifluoromethylsulfonyloxybicyclo[2.2.1]-hepto-5-1-2,3-dicarboxyimide) to an arylsilsesquioxane polymer with an acid sensitive pendant group of the formula (wherein (m) is 0 or 1; (n) is 3 or more; at least 15% of R represents t- butyloxycarbonyl and the other part of R represents H or t-butyloxycarbonyl), a positive silicon-containing photo resist, which exhibits high sensitivity to DUV, e-beam, X-ray exposure system and is capable of developing in an alkaline aqueous solution containing no metal ion, is produced.
Inventors:
UIRIAMU AARU BURANSUORUDO
PUREMURASA JAGANASAN
SUTEIIBU ESU MIURA
MERUIN WAREN MONTOGOMERII
HAABANSU ESU SASHUDEBU
RATONAMU SUURYAKUMARAN
PUREMURASA JAGANASAN
SUTEIIBU ESU MIURA
MERUIN WAREN MONTOGOMERII
HAABANSU ESU SASHUDEBU
RATONAMU SUURYAKUMARAN
Application Number:
JP21007393A
Publication Date:
May 29, 1996
Filing Date:
August 25, 1993
Export Citation:
Assignee:
INTAANASHONARU BIJINESU MASHIINZU CORP
International Classes:
C08G77/04; C08G77/16; C08G77/18; C08G77/38; C08L83/04; C08L83/06; G03F7/039; G03F7/075; (IPC1-7): C08G77/38; C08L83/06; G03F7/075
Attorney, Agent or Firm:
Kiyoshi Goda (2 outside)
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