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Patent Searching and Data


Title:
NEGATIVE RESISTANCE ELEMENT
Document Type and Number:
Japanese Patent JPS5250174
Kind Code:
A
Abstract:

PURPOSE: To obtain a negative resistance element that can be manufactured by addition of one selective diffusion treatment and selective etching treatment, without involving any change in the basic production processes of conventional bi-polar type transistors.


Inventors:
KUWAGATA MASAHIRO
YAMADA MASAO
KONISHI TADAO
NAKADA SHIYUUJI
NAKAMURA KENICHIROU
KAWAKAMI YORISADA
Application Number:
JP12652675A
Publication Date:
April 21, 1977
Filing Date:
October 20, 1975
Export Citation:
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Assignee:
MATSUSHITA ELECTRONICS CORP
International Classes:
H01L29/66; H01L21/331; H01L29/00; H01L29/70; H01L29/73; H01L29/86; H01L49/00; (IPC1-7): H01L29/00; H01L29/70; H01L49/00
Domestic Patent References:
JPS4953781A1974-05-24
JPS5057386A1975-05-19
Foreign References:
US3087099A1963-04-23