Title:
NEW PHOSPHORIC ACID DIESTER HAVING UV ABSOPTIVITY, ITS PRODUCTION AND COSMETIC CONTAINING THEREOF
Document Type and Number:
Japanese Patent JP3555902
Kind Code:
B2
Abstract:
PURPOSE: To obtain a new phosphoric acid diester useful as an effective component for sun protection cosmetics, being highly safe for skin and having UV preventing effect with high remaining ability and excellent persistency on skin.
CONSTITUTION: A phosphoric acid diester of the formula I[R1 is at least an acyl having 1 benzene ring (preferably p-methoxycinnamoyl, etc.); R2 is a 2-12C alkylene; L is a 2-40C alkyl or a R1-O-R2 group; M is H or an alkali metal ion, etc.; n is valence of M]. E.g. a compound of the formula II, etc. The compound of the formula I is obtained, e.g. by reacting a carboxylic acid having at least 1 benzene ring with a diol having 2-12C alkylene to obtain a monoester derivative, which is reacted with phosphorus oxychloride and then salt-exchanged or neutralized.
Inventors:
Shinji Yano
Munehisa Okutsu
Katsumi Kita
Yoshiaki Fujikura
Junichi Fukasawa
Munehisa Okutsu
Katsumi Kita
Yoshiaki Fujikura
Junichi Fukasawa
Application Number:
JP5708494A
Publication Date:
August 18, 2004
Filing Date:
March 28, 1994
Export Citation:
Assignee:
Kao Corporation
International Classes:
A61K8/00; A61K8/92; A61Q1/00; A61Q1/12; A61Q17/04; C07F9/09; C09K3/00; (IPC1-7): C07F9/09; A61K7/42; C09K3/00
Domestic Patent References:
| JP1160637A | ||||
| JP5025028A | ||||
| JP58021687A | ||||
| JP58128393A |
Attorney, Agent or Firm:
Alga Patent Office, a patent business corporation
Miyuki Ariga
Toshio Takano
Toshio Nakajima
Hiromi Matoba
Miyuki Ariga
Toshio Takano
Toshio Nakajima
Hiromi Matoba
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